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Home/Product/DBD Plasma Treatment System/SPK-500SWide Width RF Plasma Cleaner
SPK-500S輪播大圖.png
SPK-500S輪播大圖.png

SPK-500SWide Width RF Plasma Cleaner

Product comparison

Product Features

  • Using a unique plasma generating structure, the conventional treatment temperature is less than 35 °C, uniform and stable;
  • There will be no arc break, partial arc, no arc, etc., and will not cause temperature effects on cleaning products;
  • Equipped with a fully automatic vacuum capacitor matching device to generate high-density plasma to ensure excellent cleaning effect;
  • It acts directly on the surface of the material, and the processing uniformity of different positions of the same material is extremely high;
  • Product description
  • Specification parameters
  • Hardware options
SPK-500S wide-width radio frequency plasma cleaning machine is a device that will not cause damage to the surface of the material, and will not cause arc breakage, partial arc, no arcing, etc. It does not require a vacuum chamber or a harmful gas suction system. Customized wide-format linear plasma line equipment.
working principle

Plasma surface treatment is to ionize the gas into plasma by applying sufficient energy to it. The "active" components of plasma include: ions, electrons, atoms, active genes, etc. Plasma treatment is to use the properties of these active components to treat the surface of the sample, so as to achieve cleaning, modification, etching and other purposes.
The structure of the wide-width plasma cleaning machine is mainly divided into four major components: high-voltage excitation power supply, linear plasma generating device, gas delivery system, and control system.
(A)High voltage excitation power supply:The RF power supply (13.56MHz) is used for excitation to ensure uniform plasma and stable processing. The parameters can be adjusted according to the actual situation of the sample, and the modified effect has been achieved.
(B)Linear plasma generating device:Using a unique plasma generating structure, the conventional processing temperature is less than 35 °C, uniform and stable, and the service life and performance of the equipment are improved and guaranteed.
(C)Gas delivery system:With Ar and O? gas, according to the different cleaning materials, with different gases.
(D)Control System:The role of the control system is to control the operation of the entire wide-width radio frequency plasma cleaning equipment, as well as the protection of the overall system.



Industry application


Industry-specific solutions
Mobile phone medium flexible cable application
Technical requirements①:Using RF power supply, using the carrier cycle mode to avoid excessive airflow during cable processing, which is prone to breakage, and needs to meet the production capacity at the same time.
Technical requirements ②:With water-cooling process and unique process gas formula, the treatment is uniform and efficient, and the treatment temperature is low and does not affect the product.
Technical requirements ③:It adopts the method of front and rear, equipped with 2 optional mode programs, comprehensive alarm function, and can be connected to the factory assembly line.

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